AQM Corporation H-SiOx powder resist
Electron beam lithography equipment, EUV exposure equipment, powder resist for nanoimprint lithography.
AQM's H-SiOx can be stored in powder form for a long time and is a negative-type resist that can be used after mixing with a solvent before use. Compared to pre-mixed types that are already combined with a solvent, it does not thicken, allowing for consistent film thickness, and viscosity can be adjusted to create various film thicknesses. Additionally, with a shelf life of one year, it is an economical resist with minimal waste. Recent tests have achieved a line width of 7nm. 【Features】 - Long-term storage possible (1 year) - Consistent viscosity for use at any time... it does not thicken since it is mixed with a solvent before use. - Wide range of film thicknesses can be created by adjusting viscosity - 5nm film thickness, 7nm resolution - Reduction in waste... available for purchase in small quantities. - Comprehensive support system - Excellent LER (Line Edge Roughness) - Strong resistance to dry etching For more details, please refer to the catalog or contact our representative, Kitano.
